Wako Specialty Chemicals

High purity reagents for your life’s research.

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CMP Cleaning

Highly effective Post-CMP cleaning agents.

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About Wako Specialty Chemicals

Wako Specialty Chemicals’ product offerings are very diverse (encompassing products that are used in electronics, pharmaceutical, coatings, ink, and photographic applications). Most commercial activity is concentrated in general chemistry applications involving the use of our wide range of azo initiators in free-radical polymerization processes.

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 Quality

Quality

Wako Chemicals USA is committed to producing only the highest quality chemical ingredients.  In our core business of Water-Soluble Azo initiator production, our specifications are the tightest in the industry...

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 Safety

Safety

The saying, “Safety is our #1 priority” may be cliché, but Wako USA truly strives to ensure safety for our employees, our customers, and the community. Wako encourages all employees to take an active role in safety...

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Services

Services

Wako Chemicals USA, Inc. maintains a 45,000 sq. ft. custom manufacturing facility at its base of operations in Richmond, VA. We provide custom synthesis and toll manufacturing services to various industries...

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Featured Products

V-50 Azo Initiator

V-50 Azo Initiator

Feature *water-soluble* *cationic* azo initiator 10 hour half-life decomposition temperatur, 56°C(in water) used for the polymerization of...

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VA-044 Azo Initiator

VA-044 Azo Initiator

Feature *non-nitrile* azo initiator having *low decomposition t**emperature.* soluble in* water* or methanol 10 hour half-life decomposition...

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VA-086 Azo Initiator

VA-086 Azo Initiator

Feature *non-nitrile nonionic halogen-free* azo initiator soluble in *water*, in methanol, in ethanol ethanol potential for introducing...

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 V-70 Azo Initiator

V-70 Azo Initiator

Feature solvent-soluble azo initiator having* low decomposition temperature*. An alternative to photo reaction as radical generator. soluble in...

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CLEAN-100 Post CU CMP cleaning

CLEAN-100 Post CU CMP cleaning

HIGH-PURITY, HIGH PERFORMANCE ORGANIC ACID SOLUTION FOR WAFER CLEANING. PROVEN TECHNOLOGY FOR VARIOUS SUBSTRATE METALS. HIGH-WETTABILITY HIGH METAL REMOVABILITY ONE-STEP...

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TCL Type II

TCL Type II

TiN and Co selective etchant Wide material compatibility No corrosion and damage to most materials. High etching performance Faster...

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WCP-210 (neutral) Post-W CMP cleaning

WCP-210 (neutral) Post-W CMP cleaning

WCP-210 Post W-CMP Cleaning Solution Please contact sales at Wako Chemicals USA, INC for more...

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CLEAN-8901 (ALKALINE TYPE) Post-CU CMP

CLEAN-8901 (ALKALINE TYPE) Post-CU CMP

HIGH CLEANING PERFORMANCE TMAH-FREE Cu2O termination No Corrosion  

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